CONTINUOUS THERMAL VACUUM DEPOSITION DEVICE AND METHOD

摘要

The invention relates to a coating method for thermally vacuum-depositing a continuously conveyed substrate (14) that moves within a deposition channel (13) by vaporizing solid or liquid coating materials (10) and vapor-depositi ng the vaporized coating material onto the substrate in a deposition device. Th e aim of the invention is to create a coating method for thermally vacuum- depositing a continuously conveyed substrate, in which accessibility to the vaporization device (3) is improved while the processes taking place in the deposition chamber and the vaporization device can be controlled independent ly of each other. Said aim is achieved by evaporating the coating material in a t least one evaporation device located outside the deposition chamber by means of an evaporator, delivery of steam between the evaporator and the depositio n channel being regulated.