| 摘要 |
<P>PROBLEM TO BE SOLVED: To shorten the time until exposure or a process starts, when a substrate stage moved between below a substrate processing system and below an exposure optical system. <P>SOLUTION: An exposure apparatus includes: the exposure optical system which exposes a substrate to a pattern; the substrate processing system which performs a predetermined process for the substrate at a position apart from the exposure optical system; substrate stages A, B which move along a plane perpendicular to the optical axis of the exposure optical system; and a measurement devices DZ1 to 3, UZ1 to 3 which continuously measure the position of the substrate stage along the optical axis in the moving range of the substrate stage while the substrate stage moves from below the substrate processing system to below the exposure optical system. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
