EXPOSURE METHOD, EXPOSURE SYSTEM, AND METHOD FOR FABRICATING DEVICE

摘要

An exposure method and an exposure system capable of forming an accurate pattern on a substrate even when an immersion method is applied. When a plurality of shot regions (S1-S32) of a substrate P are exposed sequentially by irradiating the substrate (P) with exposure light (EL) through a projection optical system (PL) and a liquid (LQ), order of exposing the plurality of shot regions on the substrate (P) is determined such that adjacent shot regions in the plurality of shot regions on the substrate (P) are not exposed continuously.