发明名称 ADJUSTING METHOD OF PROJECTION OPTICAL SYSTEM AND ALIGNER
摘要 <P>PROBLEM TO BE SOLVED: To adjust the aberration and focus of a projection optical system partially in the surface of a lens. <P>SOLUTION: A space between neighbored lenses in a lens-barrel is divided into 9 spaces 22a-22i in the surface of the lens by partitioning members consisting of a barrel body 23 and a plate type body 24. Gas is introduced into or withdrawn out of respective spaces 22a-22i independently to change the refractive index of the gas in respective spaces in accordance with the value of adjustment, whereby the aberration and focus are adjusted. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005317626(A) 申请公布日期 2005.11.10
申请号 JP20040131327 申请日期 2004.04.27
申请人 SEIKO EPSON CORP 发明人 AKAMATSU TADAMA
分类号 G03F7/207;G02B3/14;H01L21/027 主分类号 G03F7/207
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