| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a ruthenium film or a ruthenium oxide film in which excellent adhesiveness is demonstrated to a base material, no impurities are mixed, and the ruthenium film can be deposited in a relatively short time. <P>SOLUTION: In the ruthenium film manufacturing method, volatile inorganic ruthenium compound in a gas phase state and reducing agent in a gas phase state are introduced into a reaction chamber (11) in which at least one substrate is stored, the volatile inorganic ruthenium compound and the reducing agent are reacted with each other, and ruthenium is deposited on at least one substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
