| 摘要 |
<P>PROBLEM TO BE SOLVED: To strike a balance between decrease in the price and dry etching durability in a positive resist composition using an acrylic resin. <P>SOLUTION: The positive resist composition is prepared by dissolving (A) a resist resin component and (B) an acid generating agent component in an organic solvent. The component (A) contains (A1) a resist resin component having a structural unit (a1), a structural unit (a2) and a structural unit (a3) and having the solubility with alkali increased by the effect of an acid. The structural unit is expressed by general formula (1). The structural unit (a2) is derived from an (α-low grade alkyl) acrylic acid ester having a lactone-containing monocyclic or polycyclic group. The structural unit (a3) is derived from an (α-low grade alkyl) acrylic acid ester having a polycyclic alicyclic hydrocarbon group containing a polar group. In general formula (1), R represents a hydrogen atom or a lower alkyl group, and R<SP>11</SP>represents an acid dissociable solubility inhibiting group comprising a chain-type or tertiary alkyl group. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
