| 摘要 |
An exposure apparatus that includes a first movable stage which holds a first wafer and aligns the first wafer at a predetermined position, a second movable stage which holds a second wafer and aligns the second wafer at a predetermined position, first stator coils for driving in a first direction one of the first and second movable stages located in a measurement region for measuring an exposure result, second stator coils for driving the other of the first and second movable stages located in an exposure region for performing exposure in the first direction independently of the movable stage in the measurement region, third stator coils for independently driving the first and second movable stages in a second direction perpendicular to the first direction, and a current control device for supplying to the first to third stator coils control currents having phase differences to generate driving forces between movable element magnets of the first and second movable stages and the stator coils facing the movable element magnets.
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