| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new diazodisulfone compound having high sensitivity to far ultraviolet rays, particularly represented by KrF excimer laser or ArF excimer laser and capable of providing a chemical amplification type resist excellent in line edge roughness, tolerance, etc., of depth of focus, when used as a radiation sensitive acid generator and to provide a positive type radiation-sensitive resin composition containing the diazodisulfone compound as the radiation-sensitive acid generator. <P>SOLUTION: The diazodisulfone compound is represented by formula (1) (wherein R<SP>1</SP>to R<SP>9</SP>are each a hydrogen atom, a 1-4C alkyl group, a 1-4C alkoxy group or a 1-4C hydroxyalkyl group; A is a substituted or unsubstituted 1-10C straight-chain or branched divalent hydrocarbon group). The radiation-sensitive resin composition comprises (A) the diazosulfone compound and (B) an acid-dissociative group-containing resin which becomes readily soluble in an alkali when an acid-dissociative group is dissociated. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
