发明名称 |
HDP-CVD seasoning process for high power HDP-CVD gapfil to improve particle performance |
摘要 |
A method of operating a substrate processing chamber that includes, prior to a substrate processing operation, flowing a seasoning gas comprising silane and oxygen into said chamber at a flow ratio of greater than or equal to about 1.6:1 oxygen to silane to deposit a silicon oxide film over at least one aluminum nitride nozzle exposed to an interior portion of the chamber. Also, a substrate processing system that includes a housing, a gas delivery system for introducing a seasoning gas into a vacuum chamber, where the gas delivery system comprises one or more aluminum nitride nozzles exposed to the vacuum chamber, a controller and a memory having a program having instructions for controlling the gas delivery system to flow a seasoning gas that has an oxygen to silane ratio greater than or equal to about 1.6:1 to deposit a silicon oxide film on the aluminum nitride nozzles.
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申请公布号 |
US2005250340(A1) |
申请公布日期 |
2005.11.10 |
申请号 |
US20040841582 |
申请日期 |
2004.05.07 |
申请人 |
APPLIED MATERIALS, INC., A DELAWARE CORPORATION |
发明人 |
CHEN XIAOLIN;BLOKING JASON |
分类号 |
C23C16/44;H01L21/31;H01L21/316;(IPC1-7):H01L21/31 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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