| 摘要 |
<P>PROBLEM TO BE SOLVED: To finish the corner of a pattern as a desired pattern, and to improve the pattern accuracy. <P>SOLUTION: The design pattern correction method to apply a correction, to avoid the influence of a minute step-like figure to a design pattern to form a desired planar pattern figure on a wafer includes: extracting edges QP, QR forming the vertex Q of a design pattern 31; measuring the length of the extracted edges QP, QR; deciding whether the length of the edges QP, QR is shorter than a predetermined length; extracting two vertexes P, R connected to the edges QP, QR when the length of the edges QP, QR is decided to be shorter than the predetermined length; and deforming the design pattern, to make the extracted two vertexes P, R coincide with each other. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
