| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high sensitivity and high resolving degree positive type photosensitive resin composition having characteristic features that the loss of a film thickness is reduced, the pattern shape does not collapse, and there is no scum of the photosensitive resin composition in exposed portions. <P>SOLUTION: The positive type photosensitive resin composition comprises 100 pts.wt. alkali soluble resin (A) and 1-50 pts.wt. 1,2-naphthoquinone-2-diazide-5-sulfonic acid ester and/or 1,2-naphthoquinone-2-diazide-4-sulfonic acid ester (B) of a phenolic compound represented by formula (1). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
