| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem that current apparatuses are incapable of supplying an application solution uniformly throughout the entire surface of a substrate and have poor responsiveness in control of the amount applied and low efficiency of utilization of mist, because of a simultaneous supply of mist of an application solution throughout the entire surface. SOLUTION: The subject apparatus is for supplying a mist of an application solution to the surface of a substrate to form a film and has a fractionating chamber comprising a particulate-generating nozzle atomizing the solution, a rectifying section rectifying the mist of the solution generated by the nozzle and a fractionating section fractionating the mist of the solution by causing the mist rectified by the rectifying section to float, a discharging section discharging the fractionated mist of the solution and mist-carrying piping connecting the fractionating chamber with the discharging section. The discharging section has a gas-supplying section supplying a carrier gas and a slit-formed opening discharging the carrier gas and the mist of the solution. COPYRIGHT: (C)2006,JPO&NCIPI
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