发明名称 POSITION DETECTING MARK AND RETICLE OR SENSITIVE SUBSTRATE EQUIPPED THEREWITH, POSITION DETECTING METHOD, MARK EVALUATING METHOD, MARK DETECTING METHOD AND MARK DETECTING DEVICE, EXPOSING METHOD AND EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a mark for detecting a position, which is capable of detecting a position with a good accuracy even when a detecting condition or the like is different. <P>SOLUTION: The mark AM for detecting position provided on a substrate P and employed for detecting a position in the X-axis direction of the substrate P is arranged in a first region 1 having a first width W1 in the X-axis direction, and a second region 2 arranged at a position different from the first region 1 and having a second region 2 having a second width W2 different from the first width W1 in the X-axis direction. The first region 1 is provided with a first zone L1 whose first width W1 in the X-axis direction is continued in Y-axis direction, and the second region 2 is provided with a second zone L2 whose second width W2 in the X-axis direction is continued in the Y-axis direction while the value of a positional information on a center in the X-axis direction of a first zone L1 and the value of positional information of a center in the X-axis direction of a second zone L2 are set respectively so as to be the same value on the value of designing. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005317617(A) 申请公布日期 2005.11.10
申请号 JP20040131131 申请日期 2004.04.27
申请人 NIKON CORP 发明人 KUNIYONE YUJI
分类号 G03F1/42;H01L21/027 主分类号 G03F1/42
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