| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which is improved in the superposition accuracy of a functional pattern and which suppresses drastic increase in the cost of the exposure apparatus. <P>SOLUTION: The exposure apparatus 1 has a function of relatively scanning a glass substrate 8 with a laser beam by an exposure optical system 3 to directly expose a functional pattern on the glass substrate 8. The apparatus is equipped with: an imaging means 5 to image a pixel 22 of a black matrix 21 as a reference preliminarily formed on the glass substrate 8, the imaging means disposed in the same side of the glass substrate 8 as the exposure optical system 3; an illuminating means 6 disposed in at least either the upper direction or the lower direction of the glass substrate 8 and illuminating the pixel 22 to allow imaging by the imaging means 5; and an optical system controlling means 7 to detect the reference position preliminarily determined in the pixel 22 imaged by the imaging means 5 and to control starting or stopping illumination by a laser beam based on the reference position as the reference. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
