| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming an exposure pattern so as to improve superposition accuracy of a functional pattern and to suppress drastic increase in the cost of an exposure apparatus. <P>SOLUTION: A reference glass substrate 8B having a preliminarily formed reference pattern P as the reference for the exposure position is disposed under a glass substrate 8A and carried in the direction of an arrow A by a carrying means 4. The reference pattern P is illuminated from the downside of the carrying means 4 by an illuminating means 6, and the reference pattern P is imaged by an imaging means 5 disposed above the carrying means 4 to detect the reference position preliminarily set in the reference pattern P imaged by the imaging means 5 by using an optical system controlling means 7. Starting or stopping illumination with the laser beam is controlled based on the reference position and the glass substrate 8A is exposed in a predetermined position to transfer the pixel of a black matrix as the reference of a functional pattern to be layered on the glass substrate 8A. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
