| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an improved monolithic hard pellicle to be used for photolithography. <P>SOLUTION: When the starting pellicle plate has original thickness of about 4 mm to about 5 mm, the bulk pellicle plate material may be removed at the center of a membrane such that a remaining pellicle plate material 23 at the bottom of a recessed portion 24 has a thickness ranging from about 200μm to about 900μm, more preferably from about 300μm to about 800μm, depending on its ultimate use or mounting position. However, the remaining pellicle plate material 23 may have a thickness smaller than 200μm or greater than 900μm depending on the predetermined desired thickness of the bottom optical pellicle portion of the resultant pellicle 20 as well as its ultimate use. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
