发明名称 SUBSTRATE PROCESSING APPARATUS AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method prolonging the life of a drug solution of which the performance is deteriorated owing to moisture absorption. SOLUTION: Water in the atmosphere is removed by a dry filter 1 provided on an upper part of a processing container 2, and dry air is introduced into the processing container 2. The dry air introduced into the processing container 2 is exhausted from an exhaust line 11. The substrate 5 is processed with the drug solution by supplying a drug solution 6 deteriorated in performance owing to moisture absorption onto the substrate 5 from a supply nozzle 3 penetrating the side wall of the processing container 2 while rotating the substrate 5 utilizing a rotating stage 7 after producing the flow of the dry air in the processing container 2. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005317817(A) 申请公布日期 2005.11.10
申请号 JP20040135032 申请日期 2004.04.30
申请人 RENESAS TECHNOLOGY CORP 发明人 KUME SATOSHI
分类号 H01L21/306;H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/306
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