发明名称 Liquid wiping apparatus
摘要 The present invention provides a liquid wiping apparatus that can eliminate the increase in the thickness of membranous liquid and defects in the surface quality resulting from the attachment of splash onto the surface of a metallic strip and can improve the productivity in a manner of accelerating the line speed. The liquid wiping apparatus according to this invention includes blade wipers for contacting with a molten metal having been attached onto the metallic strip 1 to mechanically wipe the molten metal. In the liquid wiping apparatus, a pressure applying means 7 of the static pressure pad type using gas is installed at the outlet side of the blade wiper 6 in the strip running direction, and phase-mixed flow of gas/liquid 15 is produced in membranous liquid running between the blade wiper 6 and the strop 1.
申请公布号 US2005247262(A1) 申请公布日期 2005.11.10
申请号 US20050092576 申请日期 2005.03.29
申请人 MITSUBISHI-HITACHI METALS MACHINERY, INC. 发明人 YOSHIKAWA MASASHI;HIRANO TATSUYA;FUJIOKA HIRONORI;NAGAI TAKANORI
分类号 C23C2/22;C23C2/20;(IPC1-7):B05C11/02;B05D3/04;B05D3/12 主分类号 C23C2/22
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