| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of precisely forming a fine pattern having a satisfactory sectional form with high sensitivity by containing a polysilane having a specified repeat unit and a benzophenone compound having an organic oxide. SOLUTION: This photosensitive composition contains a polysilane having a repeat unit represented by the formula I and a benzophenone compound having an organic compound. In the formula I, Ar represents a substituted or unsubstituted aryl group. In this pattern forming method, a photosensitive composition containing a polysilane represented by the formula II and a benzophenone compound having an organic peroxide is used. In the formula II, R11 represents hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group, R12 represents a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group. |
