VACUUM DEPOSITION APPARATUS AND METHOD OF PRODUCING VAPOR-DEPOSITED FILM

摘要

This invention relates to a vacuum vapor-deposition apparatus for forming vapor-deposited films on a base film, thereby to produce vapor-deposited films, and also to a method of producing vapor-deposited films. In the vacuum vapor-deposition apparatus, the synchronizing means (18) equalizes the circumference velocity v1 of the coating roll (14) and the circumference velocity v2 of the takeup guide roll (15). Hence, v1 = v2. Therefore, the takeup guide roll (15) never rubs the vapor-deposited layer provided on the surface of the film. This eliminates the possibility that the vapor-deposited layer has scratches. The vapor-deposited layer can therefore possess desired properties. <IMAGE>