MEMBER OF APPARATUS FOR PLASMA TREATMENT, MEMBER OF TREATING APPARATUS, APPARATUS FOR PLASMA TREATMENT, TREATING APPARATUS AND METHOD OF PLASMA TREATMENT

摘要

According to the present invention, gas in which oxygen gas and krypton are mixed is introduced into a process vessel from a process gas supply source while a processing target made of an aluminum alloy in the process chamber is kept at a predetermined temperature, and plasma is generated in the process vessel by a microwave. Radical oxidation processing by an oxygen radical generated thereby is applied to a surface of the processing target, so that a dense oxide coating film with improved corrosion resistance is formed on the surface of the processing target. <IMAGE>