发明名称 SUBSTRATE FOR VERTICAL ALIGNMENT AND PROCESS FOR PRODUCING VERTICALLY ALIGNED LIQUID CRYSTAL RETARDATION FILM
摘要 <p>A substrate for alignment whereby a vertically aligned liquid crystal retardation film can be obtained by a simple method without special treatment, and a fabrication method of a vertically aligned liquid crystal retardation film using the substrate for alignment, are provided. By using a substrate for vertical alignment in which a layer of an acrylic polymer is formed on the surface of a layer of an inorganic substance, and providing a layer of a liquid crystal compound on the substrate by coating, etc., the liquid crystal compound can be vertically aligned.</p>
申请公布号 EP1593991(A1) 申请公布日期 2005.11.09
申请号 EP20040707651 申请日期 2004.02.03
申请人 NIPPON KAYAKU KABUSHIKI KAISHA;POLATECHNO CO., LTD. 发明人 TANAKA, KOUICHI
分类号 G02B5/30;G02F1/1337;(IPC1-7):G02B5/30;G02F1/133 主分类号 G02B5/30
代理机构 代理人
主权项
地址