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发明名称
Novel photoresist monomer, polymer thereof and photoresist composition containing it
摘要
申请公布号
KR100527532(B1)
申请公布日期
2005.11.09
申请号
KR19990043846
申请日期
1999.10.11
申请人
发明人
分类号
G03F7/039;(IPC1-7):G03F7/039
主分类号
G03F7/039
代理机构
代理人
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