EUV Lithographic Projection Apparatus comprising an Optical Element with a Self-Assembled Monolayer, Optical Element with a Self-Assembled Monolayer, Method of applying a Self-Assembled Monolayer, Device Manufacturing Method and Device Manufactured thereby

摘要

A lithographic apparatus contains an optical element, the surface of the optical element being modified to reduce the effects of reflectivity reduction by molecular contamination. The surface includes a self assembled monolayer.