发明名称 Fabrication method of semiconductor device
摘要 The present invention provides a technology capable of shortening a TAT of a microcomputer with a nonvolatile memory built therein and achieving a reduction in cost. Flash ROMs comprising memory cells each substantially identical in structure to each of memory cells of a flash memory are formed in their corresponding chips lying in a wafer. Subsequently, memory information is written into each of the memory cells of the flash ROM in a probe test process. Thereafter, the memory information written into the memory cell thereof is made unreprogrammable to thereby disable rewriting of the post-shipment memory information. Thus, the shortening of a TAT can be achieved as compared with a mask ROM built-in microcomputer, and management and fabrication costs can be reduced.
申请公布号 US6963513(B2) 申请公布日期 2005.11.08
申请号 US20040919350 申请日期 2004.08.17
申请人 RENESAS TECHNOLOGY CORP. 发明人 YAMAMOTO TOSHITAKA;SATOU SHOUJI
分类号 H01L27/10;G06F13/28;G11C11/00;G11C16/22;G11C17/10;H01L21/00;H01L21/336;H01L21/8246;H01L21/8247;H01L27/112;(IPC1-7):G11C11/00 主分类号 H01L27/10
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