| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist exfoliation composition capable of exfoliating a resist without using dangerous hydroxylamine. SOLUTION: The resist exfoliation composition comprises carbonic acid and/or a carbonate, hydrogen peroxide, an organic nitrile and water, wherein a carbonic acid and/or carbonate content, a hydrogen peroxide content, an organic nitrile content and a water content are preferably 0.01-40 wt.%, 10 ppm to 3.9 wt.%, 0.1-70 wt.% and 25-99.9 wt.%, respectively, based on the total weight of the components. COPYRIGHT: (C)2006,JPO&NCIPI
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