| 摘要 |
<P>PROBLEM TO BE SOLVED: To detect a focusing position of a projection optical system in an aligner which projects and transfers the pattern of a reflection type original plate to a substrate. <P>SOLUTION: The aligner is equipped with an original plate stage 10 which holds and drives the reflection type original plate 1, a substrate stage 12 which holds and drives a substrate 2, the projection optical system 3 which projects the pattern of the reflection type original plate 1 on the substrate 2, an evaluating unit 5 which evaluates a focus mark formed on a reference member 13 provided to the substrate stage 12 by lighting it up with measurement light through a reflecting surface formed on a reference member 11 provided to the original plate stage 10, and a controller 9 which detects the focusing position of the projection optical system 3 based upon an evaluation result of the evaluating unit 5. The controller 9 when detecting the focusing position of the projection optical system 3 moves the original plate stage 10 along the optical axis AXM of the measurement light, and also moves the substrate stage 12 nearly at right angles to the optical axis AXW of the projection optical system 3 so that the measurement light is incident on the reference member 13. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
