发明名称 OPTICAL MEMBER, OPTICAL SYSTEM AND EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To reduce stress double refraction quantity and the anisotropy of stress double refraction in an optical system having crystalline optical members. <P>SOLUTION: A plurality of optical members each of which consists of single crystal whose crystal structure belongs to a point group O, Oh or Td and has axially symmetrical stress distribution having a prescribed crystal axis direction as a symmetrical axis are arranged so as to be relatively rotated around the symmetrical axis by prescribed angles so that the symmetrical axes of the stress distribution coincide with each other. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005308876(A) 申请公布日期 2005.11.04
申请号 JP20040122952 申请日期 2004.04.19
申请人 NIKON CORP 发明人 MURAMATSU KENICHI
分类号 G02B1/02;H01L21/027 主分类号 G02B1/02
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