发明名称 PLANARIZED ARTICLE AND METHOD FOR PLANARIZING ARTICLE
摘要 PROBLEM TO BE SOLVED: To provide a planarized article excellent in a gas barrier property and used for display substrates, etc., having extremely few projections (unevenness) which become a cause of breaking or electric current short on a transparent conductive layer which becomes an electrode and to provide a method for planarizing an article. SOLUTION: The planarizing method comprises forming a protective layer 12 having etching resistance to the surface of an article to be processed, applying etching treatment from the surface of the protective layer 12, eliminating projections of the article to be processed protruded from the protective layer 12 by etching or further eliminating also the protective layer 12. In the planarized article, the protective layer is preferably a photoresist layer and the gas barrier layer 13 is preferably a transparent inorganic compound layer and maximum protection length Rmax of the planarized surface of the planarized article obtained by the planarizing method is 2-2,000 nm. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005307098(A) 申请公布日期 2005.11.04
申请号 JP20040129124 申请日期 2004.04.26
申请人 DAINIPPON PRINTING CO LTD 发明人 KISHIMOTO YOSHIHIRO;KOMADA MINORU
分类号 C08J7/00;C23F1/16;C23F4/00;(IPC1-7):C08J7/00 主分类号 C08J7/00
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