发明名称 |
ALIGNMENT EQUIPMENT AND METHOD, CARRYING SYSTEM AND METHOD, OPTICAL LITHOGRAPHY SYSTEM AND METHOD, AND PROCESS FOR FABRICATING DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To control the temperature of a substrate without increasing the size or lowering the throughput of the equipment. <P>SOLUTION: The alignment equipment for setting a substrate W in a predetermined rotational state comprises a first detection means 21 for detecting the rotational state of the substrate W, a rotary means 18 rotatable about a predetermined point while mounting the substrate W and setting the substrate W in a predetermined rotational state based on the detection results from the first detection means 21, and a first temperature control means for controlling the temperature of the substrate W. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2005311113(A) |
申请公布日期 |
2005.11.04 |
申请号 |
JP20040126877 |
申请日期 |
2004.04.22 |
申请人 |
NIKON CORP |
发明人 |
JINBO TSUTOMU |
分类号 |
G03F9/00;H01L21/027;H01L21/677;H01L21/68 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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