| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for evaluating a pattern forming process which can be simply and quickly executed and has a high reliability. <P>SOLUTION: The method comprises the steps of coating a photoresist on a processed board; approximating or overlapping a first pattern 100 containing a plurality of lines 10 which are composed of bright parts, have line widths of an identical length and a wavelength order or less of a light, and are arranged in parallel and periodically by aligning both ends 50 in a longitudinal direction and a second pattern 900 having a larger area than the line 10 composed of the bright part, to be transferred to the photoresist; and measuring a retreated amount of the end 50 measured in the longitudinal direction of the line 10, of a pattern formed on the processed board by using the first pattern 100 transferred to the photoresist, by any optical means. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
