PHOTOSENSITIVE POLYMER COMPOSITION, METHOD FOR MANUFACTURING RELIEF PATTERN BY USING THE SAME, AND ELECTRONIC COMPONENT

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive polymer composition which suppresses production of a metal salt and shows a rust prevention effect on a metal layer, a prevention effect against ion migration and improvement in the adhesion with a substrate, to provide a method for manufacturing a relief pattern by using the composition, and to provide electronic components.

SOLUTION: The photosensitive polymer composition comprises: (a) a polyimide precursor or polyimide soluble with an alkali aqueous solution; (b) a compound which generates an acid by light; and (c) a cyclic compound. The method for manufacturing a relief pattern includes steps of applying and drying the above photosensitive polymer composition on a supporting substrate, exposing, developing, and heat treating it.

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