| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate-holding member and an aligner which can maintain exposure accuracy and measurement accuracy by suppressing the temperature change of a fluid, and the generation of temperature distribution, when applying immersion method. <P>SOLUTION: A substrate holder PH is used in the aligner for exposing a substrate P, by irradiating the exposure light on the substrate P via a projection optical system PL and fluid LQ. The substrate holder PH is coated by a functional layer 35 composed of a material which can be processed, in such a way that a contact surface 34A in contact with substrate P possesses profile irregularity higher than that of the substrate PB of the substrate holder PH. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
