| 摘要 |
PROBLEM TO BE SOLVED: To provide a target which does not form a nodule when being sputtered, and to provide an amorphous transparent electroconductive film superior in etching properties and in transparency for a light particularly having a wavelength of 400 to 450 nm. SOLUTION: The sputtering target comprises indium oxide, zinc oxide and magnesium oxide. Then, the sputtering target does not form the nodule when being sputtered. The amorphous transparent electroconductive film comprises indium oxide, zinc oxide and magnesium oxide. Then, the amorphous transparent electroconductive film is superior in etching properties and in transparency for the light having the wavelength of 400 to 450 nm. COPYRIGHT: (C)2006,JPO&NCIPI
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