发明名称 IN-SITU SURFACE TREATMENT FOR MEMORY CELL FORMATION
摘要 A system and methodology are disclosed for forming a passive layer on a conductive layer, such as can be done during fabrication of an organic memory cell, which generally mitigates drawbacks inherent in conventional inorganic memory devices. The passive layer includes a conductivity facilitating compound, such as copper sulfide (Cu2S), which is generated from an upper portion of a conductive material. The conductive material can serve as a bottom electrode in the memory cell, and the upper portion of the conductive material can be transformed into the passive layer via treatment with a plasma generated from fluorine (F) based gases.
申请公布号 WO2005104187(A1) 申请公布日期 2005.11.03
申请号 WO2005US04654 申请日期 2005.02.11
申请人 ADVANCED MICRO DEVICES, INC.;HUI, ANGELA, T. 发明人 HUI, ANGELA, T.
分类号 H01L21/00;H01L21/311 主分类号 H01L21/00
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