| 摘要 |
<p>With respect to the jet washing of a large thin substrate, such as a semiconductor substrate or a glass substrate, there is provided a cleaning method of high cleaning effect without damaging the substrate. Pure water (3) is added to an aqueous solution of isopropyl alcohol (IPA), in particular, solid liquid mixture (4a) consisting of ice (5) and a water-IPA solution so that the IPA concentration based on the whole mixture is regulated to realize an enhanced jettability. Consequently, cleaning can be performed without using of any carrier gas. Alternatively, an IPA solution is added in place of the pure water (3) so that similarly an enhanced jettability is realized and further so that the freezing point thereof is regulated to enable regulation of the amount of ice formed.</p> |
