发明名称 Semiconductor device and manufacturing method thereof
摘要 The present invention is a semiconductor device having the semiconductor element obtained by cutting a semiconductor wafer with the electrode pad formed on one side along a scribe line, a semiconductor element protective layer on the semiconductor element which has a opening on the pad, a stress cushioning layer on the layer which has the opening on the pad, a lead wire portion reaching the layer from the electrode pad via the openings, external electrodes on the lead wire portion, and the conductor protective layer on the layers, the layer and the conductor protective layer forming the respective end faces on the end surface of the semiconductor element inside the scribe line and exposing the range from the end face of the end surface to the inside of the scribe line.
申请公布号 US2005245061(A1) 申请公布日期 2005.11.03
申请号 US20050168460 申请日期 2005.06.29
申请人 SATOH TOSHIYA;OGINO MASAHIKO;SEGAWA TADANORI;YAMAGUCHI YOSHIHIDE;TENMEI HIROYUKI;KAZAMA ATSUSHI;ANJO ICHIRO;NISHIMURA ASAO 发明人 SATOH TOSHIYA;OGINO MASAHIKO;SEGAWA TADANORI;YAMAGUCHI YOSHIHIDE;TENMEI HIROYUKI;KAZAMA ATSUSHI;ANJO ICHIRO;NISHIMURA ASAO
分类号 H01L23/29;H01L21/301;H01L21/3205;H01L21/56;H01L21/60;H01L21/768;H01L23/31;H01L23/485;H01L23/52;H01L23/522;(IPC1-7):H01L21/50 主分类号 H01L23/29
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