发明名称 Deposition apparatus for temperature sensitive materials
摘要 A system for the deposition of vaporized materials on a substrate is described, comprising at least first and second orientation-independent apparatuses for directing vaporized organic materials onto a substrate surface to form first and second films, each of the first and second orientation-independent apparatuses being arranged in a different relative orientation and comprising: a chamber containing a quantity of material; a permeable member at one end of the chamber with a heating element for vaporizing the material; and a piston at the other end of the chamber for continuously feeding the material toward the permeable member as it is vaporized, whereby organic material vaporizes at a desired rate-dependent vaporization temperature at the one end of the chamber. A plurality of thin films may be deposited on a substrate using deposition apparatus in a variety of orientations. Such a design provides reduced costs and improved deposition rate control.
申请公布号 US2005244580(A1) 申请公布日期 2005.11.03
申请号 US20040837190 申请日期 2004.04.30
申请人 EASTMAN KODAK COMPANY 发明人 COK RONALD S.;LONG MICHAEL
分类号 C23C14/12;C23C14/24;C23C14/56;H05B33/10;(IPC1-7):C23C16/00 主分类号 C23C14/12
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