| 摘要 |
A thin film transistor (TFT) having a lightly doped drain (LDD) structure includes a lightly doped drain (LDD) region formation pattern, an active layer formed in an uneven structure on the LDD region formation pattern, and having a source region and a drain region having an LDD region. A gate electrode may be formed on a gate insulating layer, and source and drain electrodes are coupled to the source and drain regions.
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