INDUCING SEMICONDUCTOR CRYSTALLIZATION USING A CAPILLARY STRUCTURE

摘要

A method for fabricating a semiconductor device includes providing a layer of a semiconductor material on at least a portion of a surface of a substrate, and forming along the surface a capillary structure, which is in communication with the semiconductor material but is at least partially empty of the semiconductor material. The semiconductor material is heated, so as to cause the semiconductor material to melt and flow into the capillary structure. Upon allowing the semiconductor material to cool, a crystal is seeded in the capillary structure and spreads from the capillary structure through an area of the semiconductor material.