Vacuum vapor deposition apparatus

摘要

A vacuum vapor deposition apparatus includes a evacuable container ( 11 ), a support mechanism ( 30 ) disposed inside the evacuable container and including a support frame ( 32 ) for supporting substrates ( 344 ) on turnable support plates ( 34 ), a rotating mechanism ( 20 ) disposed outside the evacuable container and attached to the support mechanism, and at least one vapor source ( 40 ) disposed inside the evacuable container and opposite to the support plates, for producing a vapor of material to be deposited on the substrates. The support mechanism includes a turning mechanism ( 36 ), and a control unit for controlling operation of the turning mechanism. The turning mechanism is connected with the support plates. The support plates are turnable in the container via the turning mechanism and the control unit.