发明名称 Method of photolithographic production of polymer arrays
摘要 In one embodiment of the invention, methods for synthesizing polymers on a substrate are provided. The method includes the steps of coupling a monomer into exposed areas of a substrate in positive-tone application of a photoresist, or coupling a monomer into unexposed areas of a substrate in negative-tone application of a photoresist, where at least one area of the substrate is coated with the photoresist.
申请公布号 US2005244755(A1) 申请公布日期 2005.11.03
申请号 US20050179220 申请日期 2005.07.11
申请人 AFFYMETRIX, INC. 发明人 XU GUANGYU;GOLDBERG MARTIN J.
分类号 B05D3/00;C12M1/34;G03C5/00;H01L21/00;(IPC1-7):G03C5/00 主分类号 B05D3/00
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