| 发明名称 |
Method of measuring the overlay accuracy of a multi-exposure process |
| 摘要 |
A method of measuring the overlay accuracy of a multi-exposure process is provided. The characteristic of this invention is utilizing a scanning electron microscope for monitoring the overlay accuracy real-time during the multi-exposure processes in stead of the conventional optical measurement method.
|
| 申请公布号 |
US2005244729(A1) |
申请公布日期 |
2005.11.03 |
| 申请号 |
US20040834117 |
申请日期 |
2004.04.29 |
| 申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
LIU GEORGE;CHANG VENCENT;CHEN CHIA-CHEN |
| 分类号 |
G03C5/00;G03F7/20;G03F9/00;H01L23/544;H01L23/58;H01L29/10;(IPC1-7):G03F9/00 |
主分类号 |
G03C5/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
