发明名称 Oxidizing method and oxidizing unit for object to be processed
摘要 The invention is an oxidizing method for an object to be processed, the oxidizing method including: an arranging step of arranging a plurality of objects to be processed in a processing container whose inside can be vacuumed, the processing container having a predetermined length, a supplying unit of an oxidative gas and a supplying unit of a reducing gas being provided at the processing container, each of the plurality of objects to be processed having an exposed silicon layer and an exposed tungsten layer; an active-species forming step of supplying the oxidative gas and the reducing gas into the processing container, causing the both gases to react on each other under a reduced pressure, and generating active oxygen species and active hydroxyl species in the processing container; and an oxidizing step of oxidizing surfaces of the silicon layers of the plurality of objects to be processed by means of the active species.
申请公布号 US2005241578(A1) 申请公布日期 2005.11.03
申请号 US20050072416 申请日期 2005.02.17
申请人 AOKI KIMIYA;SUZUKI KEISUKE;IKEUCHI TOSHIYUKI 发明人 AOKI KIMIYA;SUZUKI KEISUKE;IKEUCHI TOSHIYUKI
分类号 H01L21/283;B05C11/00;C23C16/00;H01L21/00;H01L21/31;H01L21/316;H01L21/768;H01L23/522;(IPC1-7):C23C16/00 主分类号 H01L21/283
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