| 摘要 |
Exposure apparatus for structure exposure of a photoreactive material of a photoreactive layer with electromagnetic radiation, having a radiation source of electromagnetic radiation at a predetermined wavelength lambda, a mask device in a form of a plate and having input and output faces for electromagnetic radiation. The mask device has a mask structure element composed of a mask material, which has a predetermined refractive index n<SUB>core </SUB>at the wavelength of the electromagnetic radiation, and a surrounding material which is adjacent to surfaces of the mask structure element, which run essentially at right angles to an x direction and have a refractive index n<SUB>xclad </SUB>at the predetermined wavelength, with the x direction being a predetermined direction parallel to a plate level of the mask device, and having predetermined mathematical relationships between the variables n<SUB>core</SUB>, n<SUB>xclad</SUB>, lambda and d<SUB>xcore</SUB>, with d<SUB>xcore </SUB>being the extent of the mask structure element in the x direction.
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