发明名称 |
A METHOD FOR PROCESSING A SUBSTRATE |
摘要 |
<p>A method for processing a substrate (25, 620, 720) on a ceramic substrate heater (20, 600, 700) in a process chamber (10). The method includes forming a protective coating (730, 790) on the ceramic substrate heater (20, 600, 700) in the process chamber (10) and processing a substrate (25, 620, 720) on the coated substrate heater. The processing can include providing a substrate (25, 620, 720) to be processed on the coated ceramic substrate heater, performing a process on the substrate (25, 620, 720) by exposing the substrate (25, 620, 720) to a process gas, and removing the processed substrate from the process chamber (10).</p> |
申请公布号 |
WO2005103325(A1) |
申请公布日期 |
2005.11.03 |
申请号 |
WO2005US04905 |
申请日期 |
2005.02.15 |
申请人 |
TOKYO ELECTRON LIMITED;INTERNATIONAL BUSINESS MACHINES CORPORATION;NAKAMURA, KAZUHITO;WAJDA, CORY;MOSCA, ENRICO;LEUSINK, GERT;MCFEELY, FENTON, R.;KAWANO, YUMIKO;MALHOTRA, SANDRA, G. |
发明人 |
NAKAMURA, KAZUHITO;WAJDA, CORY;MOSCA, ENRICO;LEUSINK, GERT;MCFEELY, FENTON, R.;KAWANO, YUMIKO;MALHOTRA, SANDRA, G. |
分类号 |
C23C16/16;C23C16/458;(IPC1-7):C23C16/16 |
主分类号 |
C23C16/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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