发明名称 A METHOD FOR PROCESSING A SUBSTRATE
摘要 <p>A method for processing a substrate (25, 620, 720) on a ceramic substrate heater (20, 600, 700) in a process chamber (10). The method includes forming a protective coating (730, 790) on the ceramic substrate heater (20, 600, 700) in the process chamber (10) and processing a substrate (25, 620, 720) on the coated substrate heater. The processing can include providing a substrate (25, 620, 720) to be processed on the coated ceramic substrate heater, performing a process on the substrate (25, 620, 720) by exposing the substrate (25, 620, 720) to a process gas, and removing the processed substrate from the process chamber (10).</p>
申请公布号 WO2005103325(A1) 申请公布日期 2005.11.03
申请号 WO2005US04905 申请日期 2005.02.15
申请人 TOKYO ELECTRON LIMITED;INTERNATIONAL BUSINESS MACHINES CORPORATION;NAKAMURA, KAZUHITO;WAJDA, CORY;MOSCA, ENRICO;LEUSINK, GERT;MCFEELY, FENTON, R.;KAWANO, YUMIKO;MALHOTRA, SANDRA, G. 发明人 NAKAMURA, KAZUHITO;WAJDA, CORY;MOSCA, ENRICO;LEUSINK, GERT;MCFEELY, FENTON, R.;KAWANO, YUMIKO;MALHOTRA, SANDRA, G.
分类号 C23C16/16;C23C16/458;(IPC1-7):C23C16/16 主分类号 C23C16/16
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