Provided is a method for manufacturing a fixed abrasive material (19) suitable for use in CMP planarization pads from an aqueous polymer dispersion that also includes abrasive particles (30) that involves frothing the polymer dispersion, applying the froth to a substrate, mold or carrier and curing the froth to form a fixed abrasive material (19) having an open cell structure containing between about 5 and 85 wt% abrasive particles and a dry density of about 350kg/m<3> to 1200 kg/m<3>.
申请公布号
WO2004076127(A8)
申请公布日期
2005.11.03
申请号
WO2004US04920
申请日期
2004.02.19
申请人
DOW GLOBAL TECHNOLOGIES INC.;BALIJEPALLI, SUDHAKAR;ALDRICH, DALE, J.;GRIER, LAURA, A.
发明人
BALIJEPALLI, SUDHAKAR;ALDRICH, DALE, J.;GRIER, LAURA, A.