发明名称 Device for Crystallization and method for Crystallization with the same
摘要 <p>A sequential lateral solidification (SLS) device and a method of crystallizing silicon using the same is disclosed, wherein alignment keys are formed on a substrate with one mask having a plurality of different patterns, and a crystallization process is progressed in parallel to an imaginary line connecting the alignment keys with information for a distance between the mask and the alignment key. The SLS device includes a laser beam generator for irradiating laser beams; a mask having a plurality of areas; a mask stage for moving the mask loaded thereto, to transmit a laser beam through a selective area of the mask; and a substrate stage for moving a substrate loaded thereto, to change portions of the substrate irradiated with the laser beam passing through the mask.</p>
申请公布号 KR100525443(B1) 申请公布日期 2005.11.02
申请号 KR20030096577 申请日期 2003.12.24
申请人 发明人
分类号 H01L21/324;B01D9/00;B23K26/06;H01L21/20;H01L21/268;H01L21/77;H01L21/84;(IPC1-7):H01L21/324 主分类号 H01L21/324
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