| 摘要 |
A method for manufacturing a patterned layer of a polymer, preferably a conducting polymer, is described. The method comprising the following steps: depositing a layer of resist (10) on a substrate (20); patterning the layer of resist (10); copolymerizing of a first monomer of a polymer with a second monomer to form the copolymer; depositing the copolymer on the substrate (20); and finally lifting off the layer of resist (10). The method is used for the manufacturer of a device, such as a sensor. |
