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发明名称
基底接触物、半导体晶片、及其制造方法
摘要
本发明系关于一种基底接触物、半导体晶片、及其制造方法。一形成一半导体基底上之半导体晶片,包括环绕一积体电路区外部之一密封环区,本发明之基底接触物包括:一接触沟槽,延伸通过一浅沟槽隔离区以及一覆盖该基底之绝缘物且位于该积体电路区之外,该接触沟槽大体填入有一导电材料,使得该基底电性连结于该密封环区之一金属内连物。
申请公布号
TW200536053
申请公布日期
2005.11.01
申请号
TW094113441
申请日期
2005.04.27
申请人
台湾积体电路制造股份有限公司
发明人
曹训志;黄健朝;杨富量
分类号
H01L21/768;H01L27/02
主分类号
H01L21/768
代理机构
代理人
洪澄文;颜锦顺
主权项
地址
新竹市新竹科学工业园区力行六路8号
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